One trick to reduce the risk of skin damage is by choosing the right facial care products. We Need a higher awareness to see many cosmetics that uses hazardous materials which can actually damage the skin. Identify the material that is avoided and choosing skin care products smartly.
1. Imidazolidinyl urea and diazolidinyl urea
These both materials act as a preservative to prevent bacterial and fungal growth. But cause dermatitis, the rash is accompanied by redness and itching pains.
2. Deodorant (Fragrances)
Its function is to make the product which has a fragrant aroma. But inside the molecule can trigger allergic reactions as much as 14 percent of whole perfuming substance. Actually, most of skin care products does not need the fragrances except bath soap.
3. Sodium lauryl sulfate
This material contained on the lot of cleansing shampoo and creator of the foam. Actually the material is relatively safe, but if long enough contact with the skin can cause irritation and lead to dry skin. That is because detergents raised lipid layer of the skin. For such purposes, do not let the foam shampoo long hair attached. After using the shampoo rinse immediately with water until clean.
4. Mineral oil
Often become the basic ingredients of beauty products and can interfere the sweating.
5. Monoethanolamine (MEA) and triethanolamine (TEA)
The second function is to stabilize the material pH levels. But when exposed to air, they form a substance called nitrosamine potential as a nuisance. The tendency is to clog pores and trigger the formation of blackheads.
This chemical solvents, is one of the dangerous category according to the United States Environmental Protection Agency (EPA). Materials commonly found in nail polish that can cause headaches, eye irritation, and loss of memory.
7. Dimethylethanolamine (DMAE)
These materials in an cause facelift effects instant. Lots contained in the cream anti-wrinkle. Of course, the wrinkles will disappear but only for a while because of its long-term effects can cause cell damage and swelling.